Téléchargez le livre : Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System



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Éditeur :

Springer


Collection :

SpringerBriefs in Applied Sciences and Technology

Paru le : 2014-01-28



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Description

This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
Pages
40 pages
Collection
SpringerBriefs in Applied Sciences and Technology
Parution
2014-01-28
Marque
Springer
EAN papier
9784431547945
EAN EPUB
9784431547952
Informations sur l'ebook
Nombre pages copiables
0
Nombre pages imprimables
4
Taille du fichier
1075 Ko
Ce livre est accessible aux handicaps Voir les informations sur l'accessibilité
Prix
52,74 €

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