Téléchargez le livre : High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering

Fundamentals, Technologies, Challenges and Applications

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Elsevier


Paru le : 2019-08-28



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Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. - Includes a comprehensive description of the HiPIMS process from fundamental physics to applications - Provides a distinctive link between the process plasma and thin film communities - Discusses the industrialization of HiPIMS and its real world applications
Pages
398 pages
Collection
n.c
Parution
2019-08-28
Marque
Elsevier
EAN papier
9780128124543
EAN EPUB SANS DRM
9780128124550
Informations sur l'ebook
Ce livre est accessible aux handicaps Voir les informations sur l'accessibilité
Prix
195,17 €

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